X/Y alignment vernier formed on a substrate

Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S773000, C257S730000, C430S022000, C430S321000, C430S323000, C356S401000, C356S247000, C204S297050, C204S22400M, C204S279000

Reexamination Certificate

active

06864589

ABSTRACT:
A two dimensional vernier is provided along with a method of fabrication. The two dimensional vernier has a reference array patterned into a substrate, or a material overlying the substrate. An active array is patterned into photoresist overlying the substrate or the material. Both the reference array and the active array each comprise a two dimensional array of shapes. A difference between a combination of size or spacing of the shapes in each array determines vernier resolution. Vernier range is determined by a combination of vernier resolution and an integer related to a total number of shapes along a given axis. The two dimensional vernier allows an operator to readily measure the misalignment of a pattern to be processed relative to a previous pattern in two dimensions using a microscope. The two dimensional vernier reduces, or eliminates, repositioning of the microscope to determine both x-axis misalignment and y-axis misalignment. If a significant misalignment is detected the photoresist can be stripped and the lithography step repeated prior to subsequent processing, and possible yield reduction.

REFERENCES:
patent: 4742233 (1988-05-01), Kuyel
patent: 5083378 (1992-01-01), Juday
patent: 5308682 (1994-05-01), Morikawa
patent: 5557855 (1996-09-01), Hwang
patent: 5614767 (1997-03-01), Ohara
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5847818 (1998-12-01), Lin et al.
patent: 6027630 (2000-02-01), Cohen
patent: 6331369 (2001-12-01), Kawakubo et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

X/Y alignment vernier formed on a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X/Y alignment vernier formed on a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X/Y alignment vernier formed on a substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3442615

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.