X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1995-08-11
1997-04-08
Wong, Don
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, G21K 106
Patent
active
056195486
ABSTRACT:
A monochromator positioned in the path of a plurality of X-rays to simultaneously impinge the plurality of X-rays onto a thin-film at various angles of incidence, typically greater than a critical angle .psi..sub.c. The monochromator may be cylindrically or toroidally shaped, defining two focal areas with a source of X-rays positioned at the first focal point and a sample containing the thin-film layer positioned at the second focal point. A position sensitive detector is positioned to sense monochromatic X-rays reflected from the thin-film and produce a signal corresponding to both intensity and an angle of reflection of the monochromatic X-rays sensed. A processor is connected to receive signals produced by the detector to determine, as a function of intensity and angle of reflection of the monochromatic X-rays impinging on the detector, various properties of the structure of the thin-film layer, including the thickness, density and smoothness.
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Oryx Instruments and Materials Corp.
Schneck Thomas
Wong Don
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