X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1991-09-04
1992-07-21
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 49, 378 83, G21K 106
Patent
active
051329972
ABSTRACT:
An X-ray spectroscopic analyzing apparatus which comprises a source of X-rays, a first analyzing crystal for diffracting the X-rays from the X-ray source, and a second analyzing crystal for diffracting the X-rays from the X-ray source and also for passing therethrough a diffracted X-ray component from the first analyzing crystal. The first and second analyzing crystals are so disposed and so positioned as to permit the diffracted X-ray components of different wavelengths to travel along a single path towards a sample to be analyzed. On an optical path extending between the X-ray source and the sample, a filtering means for cutting a portion of the X-rays which has a wavelength shorter than a predetermined wavelength.
REFERENCES:
patent: 4884290 (1989-11-01), Tamura et al.
Kojima Shinjiro
Utaka Tadashi
Church Craig E.
Rigaku Industrial Corporation
LandOfFree
X-ray spectroscopic analyzing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray spectroscopic analyzing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray spectroscopic analyzing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-850633