X-ray or gamma ray systems or devices – Source
Patent
1990-05-09
1999-04-06
Church, Craig E.
X-ray or gamma ray systems or devices
Source
378210, H01J 3500
Patent
active
058928103
ABSTRACT:
An x-ray lithography device in which a beam of electrons interacts with a microwave field of a quasi-optical maser such as a quasi-optical gyrotron. This maser comprises a pair of spaced mirrors defining a quasi-optical cavity therebetween, with one mirror being provided with an orifice to permit extraction of the x-ray beam produced. A Bragg reflector is connected to the mirror orifice to reduce the microwave power loss from the device through the orifice. Electrons injected in the maser cavity are caused to "wiggle" by the interacting microwave field, which functions as an undulator, so as to produce a non-coherent x-ray beam that travels along the longitudinal axis of the cavity and exits through the mirror orifice.
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P. Sprangle et al., "New X-Ray Source for Lithography," App. Phys. Lett 55,24 (Dec. 11, 1989).
A. Bienenstock and H. Winick, "Synchrotorn Radiation Research," Physics Today 36, 48 (1983).
K. Halbach, "Design of Permanent Multipole Magnets with Oriented Rare Earth Cobalt Material," Nucl. Inst. & Meth. 1691 (1980).
Sprangle et al, "An X-Ray Source for Lithography Based on a Quasi-Optical Maser Undulator", Naval Research Laboratory Memorandum Report 6274, May 9, 1989, 44 pages.
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Hafizi Bahman
Mako Frederick
Sprangle Phillip
Church Craig E.
McDonnell Thomas
Miles Edward F.
The United States of America as represented by the Secretary of
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