X-ray reflectivity system with variable spot

Details X-ray reflectivity system with variable spot X-ray reflectivity system with variable spot

2006-11-21

2006-11-21

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S084000, C378S137000

Reexamination Certificate

active

07139365

ABSTRACT:
Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. A reflectometry system can include an x-ray tube that can produce an x-ray beam having any cross-sectional shape by scanning an electron beam in an appropriate pattern over a target in an x-ray tube. For example, the electron beam can be scanned over the target in a pattern having a non-unitary aspect ratio, so that the x-ray beam is generated from a source region having a non-unitary aspect ratio. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.

REFERENCES:
patent: 5822395 (1998-10-01), Schardt et al.
patent: 5857008 (1999-01-01), Reinhold
patent: 6226349 (2001-05-01), Schuster et al.
patent: 6292538 (2001-09-01), Hell et al.
patent: 6771735 (2004-08-01), Janik et al.

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