Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Developing
Patent
1990-05-31
1992-01-07
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Post imaging processing
Developing
430139, 430502, 430510, 430522, 430966, G03C 524
Patent
active
050791346
ABSTRACT:
An X-ray photographic material which exhibits reduced crossover and exhibits no objectionable after-color (stain) upon rapid processing, comprising a transparent support having at least one photosensitive silver halide emulsion layer provided on each side of said support and having at least one layer containing a dye which absorbs light in the sensitive region of said sensitive silver halide photographic emulsion layer provided between said light-sensitive emulsion layer and the support, wherein crossover is less than 10%, said dye is adsorbed onto fine particles which fine particles provide surfaces onto which the dye can be adsorbed, said dye can be decolorized or washed out during development, and said dye is a compound selected from the group consisting of compounds represented by the formulae set forth in the specification.
REFERENCES:
patent: 2527583 (1950-10-01), Silberstein et al.
patent: 4092168 (1978-05-01), Lemahieu et al.
patent: 4130429 (1978-12-01), Van Doorselaer
patent: 4500631 (1985-02-01), Sakamoto et al.
patent: 4574115 (1986-03-01), Adachi et al.
patent: 4751174 (1988-06-01), Toya
patent: 4857446 (1989-08-01), Diehl et al.
patent: 4861702 (1989-08-01), Suzuki et al.
patent: 4900652 (1990-02-01), Dickerson et al.
patent: 4988611 (1991-01-01), Anderson et al.
Fuji Photo Film Co. , Ltd.
Neville Thomas R.
Schilling Richard L.
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