X-ray optical system formed by multilayer reflecting mirrors for

Details X-ray optical system formed by multilayer reflecting mirrors for X-ray optical system formed by multilayer reflecting mirrors for

1990-02-02

1991-06-04

Westin, Edward P.

X-ray or gamma ray systems or devices

Beam control

378 43, 378 70, 378 84, G21K 100, G21K 700

Patent

active

050220640

ABSTRACT:
An optical system for X rays having a multilayer reflecting mirror which has high reflectances for X rays of different wavelengths. One type of multilayer reflecting mirror is such that the mirror surface of the multilayer reflecting mirror is divided into a plurality of regions, and the regions are provided with multilayers which are such that the reflectance of each multilayer is maximum for X rays of a corresponding wavelength. Another type of multilayer reflecting mirror has a substrate and a plurality of multilayer laid on the substrate, wherein the wavelength of X rays to be reflected with a maximum reflectance varies from multilayer to multilayer. The optical system for X rays according to the present invention is a focusing optical system having a plurality of such multilayer reflecting mirrors and can obtain object images by using X rays of a plurality of wavelengths.

REFERENCES:
patent: 2843751 (1958-07-01), Botty et al.
patent: 4317043 (1982-02-01), Rosenbluth et al.
patent: 4675889 (1987-06-01), Wood et al.
patent: 4684565 (1987-08-01), Abeles et al.
patent: 4698833 (1987-10-01), Keem et al.
patent: 4727000 (1988-02-01), Ovshinsky et al.
Spiller, Controlled Fabrication of Multilayer Soft-X-Ray Mirrors, 1981 American Institute of Physics, pp. 1048-1050.
"The Two-Mirror Aplanat", A. K. Head, Proc. Phys. Soc. 70, pp. 945-949.

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