X-ray optical system and method for imaging a source

Details X-ray optical system and method for imaging a source X-ray optical system and method for imaging a source

2005-08-02

2005-08-02

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S085000

Reexamination Certificate

active

06925147

ABSTRACT:
An X-ray optical system with two X-ray mirrors (A,B) for imaging an X-ray source (S) on a target region is characterized in that the X-ray mirrors (A,B) are mutually tilted by an angle other than 90° such that the combined region of acceptance of the X-ray mirror (A,B) is adjusted to the shape of the X-ray source (S) and/or the target region. This increases the intensity of the focused X-ray radiation on the sample for a given emission of the X-ray source (S) power using a few, technically simple modifications.

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“Formation of Optical Images by X-rays”, Kirkpatrick and Baez, J. Opt. Soc. Am. 38, No. 9, 1948.
“X-Ray Microscope With Multilayer Mirrors”, Underwood et al., Applied Optics 25, No. 11, 1986.

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