X-ray optical element and method for its manufacture

Details X-ray optical element and method for its manufacture X-ray optical element and method for its manufacture

1993-07-12

1995-01-24

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378145, G21K 106

Patent

active

053848179

ABSTRACT:
X-ray dispersive elements comprise a stacked array of layer pairs of boron nitride and either nickel, tungsten, chromium, vanadium, iron, manganese, cobalt and combinations thereof. The boron nitride is preferably deposited through a planar magnetron sputtering process.

REFERENCES:
patent: 4727000 (1988-02-01), Ovshinsky et al.
patent: 4785470 (1988-11-01), Wood et al.
S. S. Andreev et al., "Superintense Laser Fields: Generation interation with matter and x-ray sources," SPIE Proceedings vol. 1800, pp. 195-208.
Pierre Boher et al., "Tungsten/boron nitride multilayers for X-UV optical applications." SPIE, vol. 1546, Multilayer and Grazing Incidence X-ray/EUV Optics (1991) pp. 520-536.

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