X-ray multi-layer mirror and x-ray exposure apparatus

Details X-ray multi-layer mirror and x-ray exposure apparatus X-ray multi-layer mirror and x-ray exposure apparatus

2007-01-09

2007-01-09

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S085000, C378S034000

Reexamination Certificate

active

10902149

ABSTRACT:
An X-ray multi-layer mirror having a reflection characteristic with a wider incident angle range is realized by conducting optimization processing on an Mo/Si alternate layer having a constant thickness. Film thickness distributions of Si layers and Mo layers in the Mo/Si alternate layer are determined by optimization processing for widening the angle reflection characteristic of the Mo/Si alternate layer having the constant thickness, which is a fundamental structure.

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