X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1991-12-17
1993-03-30
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, 378 85, G01T 136
Patent
active
051990580
ABSTRACT:
An x-ray monochromator is composed of a semiconductor perfect single crystal serving as a monochromator and a solid state detector for measuring and/or counting the incident x-ray photons of an x-ray beam which enters the semiconductor single crystal, the solid state detector being disposed integrally with the semiconductor perfect single crystal on a side opposite to an x-ray beam incident side thereof. A spectral measurement apparatus for measuring the structure of a specimen with application of an x-ray beam and measuring the absorption of the x-ray beam by the specimen or the reflection of the ray-ray beam from the specimen is composed of a first x-ray monochromator including a U-shaped perfect single crystal, at least one second x-ray monochromator, which is identical to the above mentioned x-ray monochromator, a first driving device for rotating the first x-ray monochromator, a second driving device for rotating the second x-ray monochromator, and a control device for differentiating signals from the solid state detector, and controlling the second driving means to locate the second x-ray monochromator at a rotated position where the differential coefficient obtained by the differentiation changes from a positive value to a negative value, and the intensity of the x-ray beam which enters second x-ray monochromator is maximized.
REFERENCES:
patent: 5008908 (1991-04-01), Jack et al.
patent: 5016267 (1991-05-01), Wilkins
Chiba Eriko
Tani Katsuhiko
Porta David P.
Ricoh & Company, Ltd.
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