X-ray mirror, and x-ray exposure apparatus and device manufactur

Details X-ray mirror, and x-ray exposure apparatus and device manufactur X-ray mirror, and x-ray exposure apparatus and device manufactur

1994-06-28

1995-10-24

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378145, G21K 100

Patent

active

054616573

ABSTRACT:
An X-ray mirror has a silicon carbide substrate having a convex cylindrical surface, and a carbon layer coated on a surface of said substrate to a thickness ranging from 10 nm to 1 .mu.m by evaporation, such as CVD. In the X-ray mirror in which the carbon layer is coated thereon beforehand, changes in the intensity of reflected light, caused by a contaminating carbon layer attached to the surface of the mirror, can be restricted. When such a mirror is used in an X-ray lithographic apparatus, the number of times the intensity of X-rays is measured or corrected or the mirror is cleaned can be greatly reduced.

REFERENCES:
patent: 3424428 (1969-01-01), Canon
patent: 4842665 (1989-06-01), Taguchi et al.
patent: 5042059 (1991-08-01), Watanabe et al.
patent: 5123036 (1992-06-01), Uno et al.
patent: 5125014 (1992-06-01), Watanabe et al.
patent: 5307395 (1994-04-01), Seely et al.
Barbee, Jr., "Sputtered Layered Synthetic Microstructure (LSM) Dispersion Elements," American Institute of Physics, No. 75, 1981, pp. 131-143.

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