X-ray microbeam generating method and device for the same

Details X-ray microbeam generating method and device for the same X-ray microbeam generating method and device for the same

1997-09-25

1999-06-22

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 43, G21K 760

Patent

active

059149981

ABSTRACT:
A method of generating an X-ray microbeam of the present invention generates an X-ray microbeam having a restricted divergence angle and desirable planeness in regions other than the focus. With this method, it is possible to compensate for a change in the degree of asymmetry ascriable to a change in the wavelength of X-rays selected, and therefore to maintain the degree of asymmetry constant. In addition, the condensing conditions including the energy of X-rays and beam size each can be set independently of the others. A device for practicing the above method is also disclosed.

REFERENCES:
patent: 5199057 (1993-03-01), Tamura et al.
patent: 5259013 (1993-11-01), Kurigama et al.
patent: 5274435 (1993-12-01), Hettrick
Rev. Sci. Instrum., vol. 66, No. 2, Feb. 1995, pp. 1506-1509, Braver et al.
EPO-Patent abstract of Japan No. 02150034, Feb. 13, 1992, Katsuhisa.

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