X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-08-10
1994-10-25
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 70, 378 81, 378206, G01N 2320
Patent
active
053596404
ABSTRACT:
An X-ray diffractometer having a simple yet accurate means for locating the surface of the sample to be examined with respect to the zero point of the X-ray (RS) is disclosed. Briefly stated, a laser (LA) and camera (KA) are positioned at preferably 90.degree. with respect to each other such that the intersection of the optical axis of the camera and the laser passes through the zero point of the diffractometer. In this fashion, the camera will see at its center, the zero point of the X-ray despite the fact that the X-ray is of course invisible to the naked eye. Accordingly, by movement of the sample (P) with respect to this camera image, the true and correct zero point of the X-ray with respect to the surface of the sample to be examined may be determined without the need for experimental and unnecessary X-ray or examination runs being taken.
REFERENCES:
patent: 5127039 (1992-06-01), Hesch
Fink Juergen
Ortega Richard
Schipper Rolf
Smith Kingsley
Boles Donald M.
Porta David P.
Siemens Industrial Automation, Inc.
Wong Don
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