X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, man

Details X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, man X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, man

1998-03-31

2000-10-03

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, G03F 900, G21K 500

Patent

active

061270687

ABSTRACT:
A surface of a silicon carbide film which is an x-ray membrane 12 is made so that the surface roughness thereof may be 1.0 nm or less in terms of Ra (center-line average roughness) and the surface may have no scratch of 0.25 .mu.m or more in width. The surface of the silicon carbide film, which is the x-ray membrane 12 is polished a diamond particle, of a predetermined particle diameter, and colloidal silica dispersed in a solution containing hydrogen peroxide as an abrasive material, so that the surface is highly precise.

REFERENCES:
patent: 5005075 (1991-04-01), Kobayashi et al.
patent: 5178977 (1993-01-01), Yamada et al.
patent: 5958627 (1999-11-01), Shoki
patent: 5989755 (1999-11-01), Shoki
English language abstract: Japanese Laid-Open Patent No. 7-75219.
Yamaguchi, Y.I. et al, "Properties of SiC Film as X-Ray Mask Membrane," Materials Research Laboratory, Hoya Corporation, pp. 197-210.

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