X-ray mask structure, and X-ray exposure process

Details X-ray mask structure, and X-ray exposure process X-ray mask structure, and X-ray exposure process

1990-03-06

1993-03-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 34, 378 35, G03F 900

Patent

active

051962837

ABSTRACT:
The present invention provides an X-ray mask structure having an X-ray transmissive membrane, an X-ray absorber held on an X-ray transmissive membrane, and a holding frame that holds the X-ray transmissive membrane, and the X-ray transmissive membrane has a layer of aluminum nitride, and the X-ray absorber has a heavy metal nitride.

REFERENCES:
patent: 4677042 (1987-06-01), Kato et al.
patent: 4735877 (1988-05-01), Kato et al.
patent: 4804600 (1989-02-01), Kato et al.
patent: 4837123 (1989-04-01), Kato et al.
patent: 5012500 (1991-04-01), Watanabe et al.
T. Kanayma et al. "Reduction in X-ray Mass Distortion Using Amorphous WN Absorber Stress Compensated with Ion Bombardment", Journal of Vacuum Science and Technoloy, Part B, vol. 6, No. 1, pp. 174-177, Feb. 1988 New York.

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