X-ray mask structure

Details X-ray mask structure X-ray mask structure

1994-01-14

1994-10-18

Thomas, Alexander S.

Stock material or miscellaneous articles

Circular sheet or circular blank

Recording medium or carrier

428172, 428201, 430 5, 378 35, G03F 900, G21K 500

Patent

active

053566866

ABSTRACT:
An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.

REFERENCES:
patent: 4804600 (1989-02-01), Kato et al.
patent: 5012500 (1991-04-01), Watanabe et al.
patent: 5048066 (1991-09-01), Fukuda
Suzuki, et al., "High Flatness Mask for Step and Repeat X-Ray Lithography" Journ. of Vacuum Science & Technology B4 Jan.-Feb. 1986, No. 1, pp. 221-225.
Patent Abstracts of Japan, Kokai No. 62-054919, vol. 11, No. 244, Aug. 1987.
Shimkunas, "Advances in X-Ray Mask Technology," Solid State Technology, Sep. 1984, pp. 192 through 199.
Strohm, et al., "Stress Compensated Si-Membrane Masks for X-Ray Lithography with Synchrotron Radiation," 7th European Conference on Electrotechnics Eurocon 86, Session A. I.: Advanced Technologies and Materials (Part 1), Apr. 21, 1986, pp. 30 through 35.

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