Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-02-17
1999-09-28
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, 378 34, 378 35, G03F 900
Patent
active
059586311
ABSTRACT:
A universal mask for use in making Integrated Circuits. The individual size masks are produced on a wafer having standardized, large size membrane area. A combined X-ray blocking and membrane stiffening layer is applied on at least one side of the wafer. This stiffening/blocking layer includes an X-ray transparent region having a size commensurate with the desired exposure field and aligned therewith.
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"Method to Adjust Magnification in X-Ray Masks," IBM Technical Disclosure Bulletin, vol. 38 No. 08, pp. 179, Aug. 1995.
"Method to Adjust Magnification and Distortion in X-Ray Masks," IBM Techinical Disclosure Bulletin, vol. 38 No. 08, pp. 67-68, Aug. 1995.
Acosta Raul E.
Maldonado Juan R.
International Business Machines - Corporation
Rosasco S.
Townsend Tiffany L.
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