X-ray mask, method of manufacturing the x-ray mask and exposure

Details X-ray mask, method of manufacturing the x-ray mask and exposure X-ray mask, method of manufacturing the x-ray mask and exposure

1993-05-28

1996-07-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 378 34, 378 35, 1566301, 1566331, G03F 900

Patent

active

055410235

ABSTRACT:
An X-ray absorbing film including an X-ray absorbing pattern of an X-ray mask uses .beta.-crystalline tantalum having the plane orientation of (002). The .beta.-crystalline tantalum film is formed by depositing tantalum on an amorphous layer. Because the film stress change due to heat is small, the strain of the X-ray absorbing pattern formed through a thermal treatment process is decreased.
When heating the X-ray absorbing film before implanting ions into the film, the stress change of the film after implanted with ions decreases and the X-ray absorbing pattern strain also decreases.

REFERENCES:
patent: 4680243 (1987-07-01), Shimkunas et al.
patent: 5188706 (1993-02-01), Hori et al.
Japanese unexamined Publication (KOKAI) * The difference from the present invention is described in the prior art portion of the specification. Feb. 14, 1991.

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