X-ray mask blank and x-ray mask

Details X-ray mask blank and x-ray mask X-ray mask blank and x-ray mask

2007-08-28

2007-08-28

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C378S035000

Reexamination Certificate

active

09052670

ABSTRACT:
An x-ray mask blank and an x-ray mask wherein, assuming that Ramaxand Raminare defined as a maximum value of Ra and a minimum value of Ra of a surface roughness (Ra: center-line average roughness) on a plurality of points within a predetermined area on an x-ray membrane 12, respectively, the surface of the x-ray membrane 12 has a surface condition so that it may satisfy an expression: (Ramax−Ramin)/(Ramax+Ramin)≦0.15.

REFERENCES:
patent: 5005075 (1991-04-01), Kobayashi et al.
patent: 5178977 (1993-01-01), Yamada et al.
patent: 7-75219 (1995-08-01), None
English language abstract: Japanese Laid-Open Patent No. 7-75219, Aug. 1995.
Yamaguchi, Y.I. et al, “Properties of SiC Film as X-Ray Mask Membrane,” Materials Research Laboratory, Hoya Corporation, pp. 197-210, 1993.

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