X-ray mask blank and method of manufacturing the same

Details X-ray mask blank and method of manufacturing the same X-ray mask blank and method of manufacturing the same

1997-03-21

1999-09-28

Nguyen, Nam

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430396, 20419228, 428336, 428450, G03F 900

Patent

active

059586273

ABSTRACT:
An X-ray mask blank (25) comprises a substrate (23), an X-ray transparent film (29), and an X-ray absorber film (27). The X-ray absorber film has a surface roughness within a range not more than 2.0 mmRa. Ra represents a center line average height. The X-ray absorber film exhibits a stress between 0 and .+-.10 MPa at a plurality of points on a predetermined area. Preferably, the X-ray mask blank is specified by a product of a stress and a thickness, both of which are measured at the same points. The product falls within a range between 0 and .+-.5.times.10.sup.3 dyn/cm.

REFERENCES:
patent: 5005075 (1991-04-01), Kobayashi et al.
patent: 5291536 (1994-03-01), Itoh et al.
patent: 5496667 (1996-03-01), Yabe et al.
patent: 5541023 (1996-07-01), Kondo et al.
patent: 5754619 (1998-05-01), Yoshihara et al.

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