X-ray mask and process comprising convex-concave alignment mark

Details X-ray mask and process comprising convex-concave alignment mark X-ray mask and process comprising convex-concave alignment mark

1992-10-20

1994-08-02

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 378 34, 378 35, G03F 900

Patent

active

053344669

ABSTRACT:
An X-ray transmission film 2 of a SiN film is formed on the surface of a mask base 1. Formed on the surface of the X-ray transmission film 2 are an LSI pattern 3, and an alignment mark 4 composed of a convex portion 4a and a concave portion 4b. On the surface of the convex portion 4a is an alignment light reflection grating pattern 5 of a tungsten film. Formed on the surface of the concave portion 4b is a metal film 7 of a tungsten film.
With this arrangement, a laser light beam 13 does not reach a semiconductor substrate 30 through the alignment mark 4. Thus, when detecting a first-order reflection diffracted light beam 14 from the alignment mark 4 by means of a photodetector, there is no inclusion of unwanted reflected light beams from the semiconductor substrate 30.

REFERENCES:
patent: 5190836 (1993-03-01), Nakazawa et al.

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