Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1985-04-15
1987-01-06
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
378 34, 378 35, H01L 7130
Patent
active
046346430
ABSTRACT:
Herein disclosed are a mask for X-ray exposure composed of a X-ray absorbing layer of tungsten having a desired pattern, a membrane transparent to X-ray and supporting the X-ray absorbing layer, a frame member reinforcing and supporting the membrane at the periphery thereof and films of titanium and/or nickel provided between the membrane and the X-ray absorbing layer. The mask makes it possible to obtain an accurate replication of extremely fine patterns and the desired pattern of the mask can be prepared by the direct dry etching of the X-ray absorbing layer using a resist pattern as the etching mask.
REFERENCES:
patent: 4037111 (1977-07-01), Coquin et al.
Extended Abstracts of the 16th (1984 International) Conference on Solid State Devices and Materials, Kobe, 1984, pp. 23-26.
J. Vac. Sci. Technol., 1982, 20-2, pp. 191-194.
Kittle John E.
NEC
Ryan Patrick J.
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