X-ray mask and its fabricating method-comprising a first and sec

Details X-ray mask and its fabricating method-comprising a first and sec X-ray mask and its fabricating method-comprising a first and sec

1991-10-11

1993-07-13

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 378 34, 378 35, G21K 500

Patent

active

052272680

ABSTRACT:
An object of the sub- invention is to offer a X-ray mask capable of providing sufficiently strong alignment signal and to improve alignment accuracy. The X ray mask of the subject invention becomes the circuitry pattern and the alignment pattern on one main surface of the X-ray permeable film. Since the structure is also provided with a X-ray absorbant pattern, and this structure enables the laser beam without attenuation to illuminate the alignment pattern formed on the other surface of the X-ray permeable film, and by further optimizing the height of the alignment marks, a sufficiently strong alignment signal is obtained.

REFERENCES:
patent: 4887283 (1989-12-01), Hosono

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