X-ray mask and fabrication process therefor

Details X-ray mask and fabrication process therefor X-ray mask and fabrication process therefor

1997-07-10

2000-05-23

Speer, Timothy

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428697, 428698, 428699, 428701, 378 34, 378 35, 430324, G03F 900, B32B 1900

Patent

active

060664185

ABSTRACT:
On a support frame of Si, an X-ray transmissive layer of SiC or so forth is formed. On the X-ray transmissive film, a predetermined pattern of X-ray absorber of an oxide, such as TaO or so forth is formed.

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Sugawara, Minoru et al., "Stress-free and amorphous Ta.sub.4 B or Ta.sub.8 SiB absorbers for x-ray masks", J. Vac. Sci. Technol. B, 7(6), Nov./Dec. 1989, American Vacuum Society, pp. 1561-1564.
Yoshihara, Takuya et al., "Variation of internal stresses in sputtered Ta films", J. Vac. Sci. Technol. B, 11(2), Mar./Apr. 1993, American Vacuum Society, pp. 301-303.
Yabe, Hideki et al., "Sputtered W-Ti Film for X-Ray Mask Absorber", Jpn. J. Appl. Phys., vol. 31 (1992) pp. 4210-4214, Part 1, No. 12B, Dec. 1992.

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