Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1982-06-30
1984-03-13
Ives, P.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
428408, 428446, 428426, 427 65, 427160, 204192C, 204192SP, 204192E, 430967, F24F 1300, B05B 500, C23C 1500, B32B 900
Patent
active
044367970
ABSTRACT:
An improved X-ray lithography mask has been fabricated by forming an X-ray absorbing lithography pattern on a supporting foil of hydrogenated amorphous carbon. The substrate foil is formed by depositing a carbon film in the presence of hydrogen onto a surface having a temperature below 375.degree. C. The hydrogen concentration is maintained sufficiently high that the resulting film has at least one atom percent of hydrogen. A film having about 20 atom percent of hydrogen is preferred. While impurities are permitted, impurities must be maintained at a level such that the optical bandgap of the resulting film is at least one electron volt. A film with an optical bandgap of about 2 electron volts is preferred.
REFERENCES:
patent: 3577325 (1971-05-01), Fairchild
patent: 3742230 (1973-06-01), Spears et al.
patent: 3824100 (1974-07-01), Griest
patent: 3925677 (1975-12-01), Fraser
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4060660 (1977-11-01), Carlson et al.
patent: 4198263 (1980-04-01), Matsuda
patent: 4218503 (1980-08-01), Reekstin et al.
patent: 4260670 (1981-04-01), Burns
patent: 4301237 (1981-11-01), Burns
"Spin Resonance Spectroscopy of Amorphous Carbon Films," by R. J. Gambino and J. A. Thompson, Solid State Communications, 34, 15-18, (1980).
"The Growth Kenetics and Properties of Hard and Insulating Carbonaceous Films Grown in an R. F. Discharge," by S. M. Ojha, H. Norstrom and D. McCulluch, Thin Solid Films, 60, 213-225, (1979).
"Mask Technology," by A. Heuberger, Part 3 of Present Status and Problems of X--Ray Lithography, in Advances in Solid State Physics, edited by J. Treusch, 265-274, (Friedr. Vieweg & Sohn, Wiesbaden, W. Ger., 1980).
"Dielectric Properties of Some Thin Organic Polymer Films," by Bernard G. Carbajal, III, Trans. of the Metallurgical Soc. of AIME, 236, 364-369, (1966).
"Insulator Thin Films Formed by Glow Discharge and Radiation Techniques," by A. M. Mearns, Thin Solid Films, 3, 201-228, (1969).
"The Electrical and Optical Properties of Amorphous Carbon Prepared by the Glow Discharge Technique," by D. A. Anderson, Philosophical Magazine, 35, 17-26, (1977).
"Preparation and Characterization of Hydrogenated Amorphous Carbon Films: Electrical and Optical Properties," PhD Thesis by Bernard S. Meyerson, City University of New York, 1-117, (1980).
"The Rearrangement of Acetylene, Benzene, Ethane, Ethylene, Methane and Naphthalene in a Microwave Discharge," by F. J. Vastola and J. P. Wightman, J. Appl. Chem., 14, 69-73, (1964).
"Deposition of Hard and Insulating Carbonaceous Films on an r.f. Target in a Butane Plasma," by L. Holland and S. M. Ojha, Thin Solid Films, 38, L17-L19, (1976).
Brady Michael J.
Meyerson Bernard S.
Warlaumont John M.
Drumheller Ronald L.
International Business Machines - Corporation
Ives P.
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