Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1979-07-12
1981-04-07
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
250505, 250510, 430967, F24F 1300, G21F 302, G21K 300, G02B 500
Patent
active
042606705
ABSTRACT:
An X-ray transparent mask (51) is comprised of a support ring (42) with a planar substrate stabilizer (41) thereon, the stabilizer having a plurality of apertures (43) therethrough, arranged in a "checkerboard" fashion. A thin X-ray transparent mask substrate (52) is placed over the stabilizer (41), the substrate having X-ray absorptive metallized patterns (53) thereon which are aligned with the apertures (43). The mask (51) is positioned proximate a semiconductor wafer (56) having a photoresist coating (30) thereon. X-rays (14) are directed at the photoresist coating (30) through the apertures (43) to selectively expose the coating. The mask (51) is then indexed one aperture position and the remaining portion of coating (30) is exposed to the X-rays (14).
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"X-ray Lithography for IC Processing", Hughes, Solid State Techn., 5/1977 pp. 39 et seq.
"High Speed . . . X-ray Lithography", Maydon et al., IEEE Transactions, 7/1975 pp. 429 et seq.
"X-ray Lithography", Watts, Solid State Techn., 5/1979, pp. 68 et seq.
"X-ray Lithography Technology Update", Wardly, Semiconductor Fabrication, 1/1978, pp. 30 et seq.
Kirk D. J.
Schilling Richard L.
Western Electric Company Inc.
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