X-ray or gamma ray systems or devices – Photographic detector support – With object support or positioning
Patent
1990-08-21
1991-12-31
Church, Craig E.
X-ray or gamma ray systems or devices
Photographic detector support
With object support or positioning
378 34, G21K 500
Patent
active
050777742
ABSTRACT:
A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.
REFERENCES:
patent: 4763344 (1988-08-01), Piestrup
patent: 7378907 (1989-07-01), Piestrup
J. R. Maldonado, "X-Ray Lithography, Where it is Now & Where it is Going" (paper presented at the 2nd Workshop on Radiation Induced & on Processing Related Electrically Active Defects on Semiconductor-Insulator Systems, Sep. 1989, MCNC, N.C.
Richard Holman, Intel Corporation, "X-Ray Lithography Using Broadband Sources" (1986) This paper Compares a Variety of Soft XC-Ray Sources for Lithography.
R. H. Pantell, R. A. Gearhart, F. R. Buskirk, "Transition Riadiation as an X-Ray Source," IEEE Quant Electr., vol. 19, pp. 1771-1781, Dec. 1983.
Alan G. Michette, "Optical Systems for Soft X-Rays," (Plenum Press N.Y., 1986) Chap. 2 and 3, p. 37 94.
E. Spiller & R. Feder, "X-Ray Lithography, " Topics in Applied Physics, vol. 22 (New York 1977).
M. A. Piestrup, J. O. Kephart, H. Park, R. K. Klein, R. H. Pantell, P. J. Ebert, M. J. Moran, B. A. Dahling & B. L. Berman, "Measurement of Transition Radiation Form Medium Energy Electrons," Phys Rev. A, vol. 32, pp. 917-927, Aug. 1985.
M. A. Piestrup, M. J. Moran, B. L. Berman, P. Pianetta, D. Seligson, "Transition Radiation as an X-Ray Source for Lithography", SPIE, vol. 773, Electron-Beam X-Ray & Ion Beam Lithographies, pp. 37-44, 1987.
M. L. Cherry, G. Hartman, D. Muller, & T. A. Prince, "Transition Radiation from Relativistic Electrons in Periodic Radiators", Phys Rev. D, vol. 10, pp. 3594-3607, Dec. 1974.
Boyers David G.
Piestrup Melvin A.
Pincus Cary
Adelphi Technology Inc.
Church Craig E.
Smith Joseph H.
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