X-ray lithography scanning mirror

Details X-ray lithography scanning mirror X-ray lithography scanning mirror

1991-05-28

1992-08-25

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 34, 378145, G21K 106

Patent

active

051425610

ABSTRACT:
An X-ray lithography optical system has an elongated concave scanning mirror spaced a first predetermined distance from a source of X-rays. The mirror has a reflecting surface of part toroidal configuration having a first radius of curvature coincident with that of a torus of which the mirror is part and spaced opposite first and second ends having a second radius of curvature, different from the first radius of curvature, coincident with that of the circle which generates the torus. A photoresist is spaced a second predetermined distance from the mirror and positioned to receive X-rays reflected by the mirror. The second predetermined distance is greater than the first predetermined distance. A mask in proximity with the photoresist permits a predetermined pattern of X-rays to impinge on the photoresist and blocks all other X-rays.

REFERENCES:
patent: 4192994 (1980-03-01), Kastner
patent: 4949367 (1990-08-01), Huizing et al.
patent: 5031199 (1991-07-01), Cole, III et al.

Affiliated with

Also associated with

Rating

X-ray lithography scanning mirror does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-ray lithography scanning mirror, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray lithography scanning mirror will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-391264