X-ray lithography mask and method for manufacturing the same

Details X-ray lithography mask and method for manufacturing the same X-ray lithography mask and method for manufacturing the same

1977-10-19

1979-05-01

Church, Craig E.

Radiant energy

Radiation controlling means

250320, 250492R, G03B 4116

Patent

active

041526015

ABSTRACT:
An x-ray lithography mask including a thick silicon peripheral rib with a window formed therein and a multi-layered membrane transparent to x-rays and visible light supported by the rib and covering the window. The membrane consists essentially of at least two silicon nitride layers and at least one silicon oxide layer sandwiched between the silicon nitride layers. The silicon nitride layers are preferably positioned at opposite surfaces of the multi-layered membrane.

REFERENCES:
patent: 3742229 (1973-06-01), Smith
patent: 3742230 (1973-06-01), Spears
patent: 3743842 (1973-07-01), Smith
patent: 3873824 (1975-03-01), Bean

Affiliated with

Also associated with

Rating

X-ray lithography mask and method for manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-ray lithography mask and method for manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray lithography mask and method for manufacturing the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-633341