X-Ray lithography mask

Details X-Ray lithography mask X-Ray lithography mask

1981-11-16

1983-08-30

Brown, J. Travis

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430312, 430314, 430966, 430967, G03C 500

Patent

active

044017383

ABSTRACT:
An X-ray mask including a pattern of X-ray absorbing material on a thin membrane is provided. The mask includes overlapping first and second patterns of X-ray absorbing material. This permits X-ray lithography printing of lines in complex patterns required for large scale integration. The X-ray mask can provide patterns of less than 20 A in thickness by X-ray irradiation.

REFERENCES:
patent: 3222173 (1965-12-01), Belko et al.
patent: 4329410 (1982-05-01), Buckley
Lyman, Electronics, pp. 92-93, Oct. 11, 1979.
Flanders, J. Vac. Sci. Technol., pp. 1615-1619, Nov./Dec. 1979.
Flanders, Appl. Phys. Lett., pp. 93-96, Jan. 1, 1980.

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