X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-08-28
2007-08-28
Yun, Jurie (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S085000, C378S145000, C359S718000
Reexamination Certificate
active
11294878
ABSTRACT:
In an x-ray lens for focusing x-rays over a large energy range wherein the lens comprises a large number of lens elements, the lens elements have a quasi-parabolic profile Y(x) according to the equationin-line-formulae description="In-line Formulae" end="lead"?Y(x)=x2/2[(r+f(x))]in-line-formulae description="In-line Formulae" end="tail"?Wherein x represents the parabola axis, l/2r represents the half parameter of the parabola and f(x) represents a function different from zero.
REFERENCES:
patent: 6668040 (2003-12-01), Cederstrom
patent: 6718009 (2004-04-01), Khounsary
Mohr Jürgen
Nazmov Vladimir
Reznikova Elena
Bach Klaus J.
Forschungszentrum Karlsruhe GmbH
Yun Jurie
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