X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2008-03-18
2008-03-18
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S084000
Reexamination Certificate
active
11340526
ABSTRACT:
To obtain an image that uses both an accurate spatial differential of an object-caused phase shift and the phase shift as contrast at a small observation field of view and under a simplified apparatus configuration , , , .a spatial differential of the object-caused phase shift and the phase shift are arithmetically obtained from the diffraction images of the object formed by simultaneous X-ray diffraction of crystals.
REFERENCES:
patent: 3446961 (1969-05-01), Ulrich et al.
patent: 5173928 (1992-12-01), Momose et al.
patent: 5259013 (1993-11-01), Kuriyama et al.
patent: 5715291 (1998-02-01), Momose
patent: 5802137 (1998-09-01), Wilkins
patent: 5812629 (1998-09-01), Clauser
patent: 5850425 (1998-12-01), Wilkins
patent: 5864599 (1999-01-01), Cowan et al.
patent: 6577708 (2003-06-01), Chapman et al.
patent: 6870896 (2005-03-01), Protopopov
patent: 7076025 (2006-07-01), Hasnah et al.
patent: 7113564 (2006-09-01), Yoneyama
patent: 7180979 (2007-02-01), Momose
patent: 04-348262 (1991-07-01), None
patent: 09-187455 (1996-01-01), None
patent: 10-248833 (1997-03-01), None
patent: WO 95-05725 (1994-08-01), None
Hirai Yasuharu
Yoneyama Akio
A. Marquez, Esq. Juan Carlos
Artman Thomas R.
Fisher Esq. Stanley P.
Glick Edward J.
Hitachi , Ltd.
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