X-ray illumination system and X-ray exposure apparatus

X-ray or gamma ray systems or devices – Beam control

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Details

378 34, 378 85, 378205, G21K 100

Patent

active

060815817

ABSTRACT:
An X-ray illumination system includes first and second X-ray mirrors for reflecting a synchrotron radiation beam, sequentially, a driving system for changing at least one of position and attitude of each of the first and second X-ray mirrors, a first measuring system for detecting a synchrotron radiation beam impinging on the first X-ray mirror, a second measuring system for measuring at least one of position and attitude of the first X-ray mirror with respect to a predetermined reference, or at least one of relative position and relative attitude between the first and second X-ray mirrors, a first control system for controlling drive of the first X-ray mirror on the basis of the measurement by the first measuring system, and a second control system for controlling drive of the second X-ray mirror on the basis of the measurement by the second measuring system.

REFERENCES:
patent: 5285488 (1994-02-01), Watanabe et al.
patent: 5394451 (1995-02-01), Miyake et al.
patent: 5448612 (1995-09-01), Kasumi et al.
patent: 5835560 (1998-11-01), Amemiya et al.
patent: 5930324 (1999-07-01), Matsui et al.
patent: 5949844 (1999-09-01), Wantanabe

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