X-ray generation system for an ultra fine lithography and a meth

X-ray or gamma ray systems or devices – Source

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Details

378122, 378120, H01J 3500

Patent

active

050688847

ABSTRACT:
An X-ray generation system for an ultra fine lithography includes a center electrode having an adjusting member, peripheral electrode having gas flow holes, a metal disc having gas flow holes for generating the X-ray from a plasma, a large capacitor, a transparent cylinder, a discharge member, Be discharge and observing windows, a cylindrical insulator, exhaust holes, a metal container, large electric power spatial gap switches, a current returning wire, an exhaust pump, and gas feeding members. Thereby, the system provides continuous operation and increased stability, controlling and discharging quantity so that the X-ray system can be easily utilized for researching and commercial applications.

REFERENCES:
patent: 4644576 (1987-02-01), Kuyel
patent: 4841556 (1989-06-01), Kato et al.

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