X-ray focusing optic having multiple layers with respective...

Details X-ray focusing optic having multiple layers with respective... X-ray focusing optic having multiple layers with respective...

2007-11-16

2010-06-15

Yun, Jurie (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

Reexamination Certificate

active

07738629

ABSTRACT:
A diffracting x-ray optic for accepting and redirecting x-rays. The optic includes at least two layers, the layers having a similar or differing material composition and similar or differing crystalline orientation. Each of the layers exhibits a diffractive effect, and their collective effect provides a diffractive effect on the received x-rays. In one embodiment, the layers are silicon, and are bonded together using a silicon-on-insulator bonding technique. In another embodiment, an adhesive bonding technique may be used. The optic may be a curved, monochromating optic.

REFERENCES:
patent: 4261771 (1981-04-01), Dingle et al.
patent: 5127028 (1992-06-01), Wittry
patent: 5757883 (1998-05-01), Haisma et al.
patent: 6498830 (2002-12-01), Wittry
patent: 04204297 (1992-07-01), None
International Search Report for corresponding PCT application No. US2007/084938 dated Jul. 17, 2008.
Celler et al., “Frontiers of Silicon-on-insulator”, Journal of Applied Physics, vol. 93, No. 9, May 1, 2003, pp. 4955-4976.

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