X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-12-29
2010-10-19
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S085000, C378S147000, C378S149000, C378S154000, C250S505100
Reexamination Certificate
active
07817780
ABSTRACT:
Disclosed is an X-ray reflecting device and an X-ray reflecting element constituting the X-ray reflecting device capable of facilitating a reduction in weight and being prepared in a relatively simple manner. The X-ray reflecting element of the present invention comprises a body made of a solid silicon, and a plurality of slits formed in the body in such a manner as to penetrate from a front surface to a back surface of the body. Each of the slits has a wall surface serving as an X-ray reflecting surface. To allow the slits in the respective X-ray reflecting elements to be located in a given positional relationship with each other, the X-ray reflecting device of the present invention comprises a plural number of the X-ray reflecting elements, which are formed into a multilayered structure in such a manner or arranged side-by-side in a horizontal direction in such a manner as to allow the slits in the respective X-ray reflecting elements to be located in a given positional relationship with each other, or stacked on each other in a vertical direction to form a stacked structure in such a manner as to allow the slits in the respective X-ray reflecting elements to be located in a given positional relationship with each other. Further, the X-ray reflecting device may comprise a plural number of the stacked structures arranged side-by-side in a horizontal direction.
REFERENCES:
patent: 4096391 (1978-06-01), Barnes
patent: 4414680 (1983-11-01), Kraus
patent: 4506374 (1985-03-01), Flynn
patent: 4856043 (1989-08-01), Zola
patent: 4933557 (1990-06-01), Perkins et al.
patent: 5233193 (1993-08-01), Arakawa
patent: 5416821 (1995-05-01), Frazier et al.
patent: 5418833 (1995-05-01), Logan
patent: 5606589 (1997-02-01), Pellegrino et al.
patent: 6018566 (2000-01-01), Eberhard et al.
patent: 6047044 (2000-04-01), Lehmann et al.
patent: 6185278 (2001-02-01), Appleby et al.
patent: 6266392 (2001-07-01), Fujinawa et al.
patent: 6301334 (2001-10-01), Tybinkowski et al.
patent: 6307917 (2001-10-01), Shimizu et al.
patent: 6396902 (2002-05-01), Tybinkowski et al.
patent: 6408054 (2002-06-01), Rahn et al.
patent: 6881965 (2005-04-01), Bowen et al.
patent: 7127037 (2006-10-01), Bowen et al.
patent: 7149284 (2006-12-01), Ikhlef
patent: 7231017 (2007-06-01), Gertsenshteyn et al.
Beijersbergen, Marco, et al. “Silicon Pore Optics: Novel lightweight high-resolution X-ray optics developed for XEUS,” inSPIE, vol. 5488, 2004, pp. 868-874.
Kondo, R, et al. “High aspect ratio electrostatic micro actuators using LIGA process,” inMicrosystem Technologies6, 2000, pp. 218-221.
Kumakhov, M.A., et al. “A neutron lens,” inNature, vol. 357, Jun. 4, 1992, pp. 390-391.
Nilsson, D., et al. “Fabrication of silicon molds for polymer optics,” inJournal of Micromechanics and Microengineering, Institute of Physics Publishing, 13, 2003, pp. S57-61.
Song, Ki-Chang, et al. “Micromachined Silicon Optical Bench for the Low Cost Optical Module,” inSPIE, vol. 3878, Sep. 1999, pp. 375-383.
Extended European Search Report for EP Counterpart Patent No. 05258110.5, 7 pgs. (Oct. 23, 2008).
O. Citterio, et al., “Large light X-ray optics: basic ideas and concepts,” XP004641424, Advances in Space Research, vol. 34, No. 12, pp. 2637-2645 (Jan. 1, 2004).
Namioka, T. “X-Ray Image Formation Optics,” X-Ray Imaging Optics, pp. 135-143, Kaku Yamamoto (Baifukan Co., Ltd.), Japan (Jul. 12, 1999).
Ezoe Yuichiro
Mitsuda Kazuhisa
Blakely , Sokoloff, Taylor & Zafman LLP
Ho Allen C.
Japan Aerospace Exploration Agency
LandOfFree
X-ray focusing device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray focusing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray focusing device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4236955