Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1988-12-15
1990-07-03
Dees, Jose
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, 430967, 378 35, G03F 100
Patent
active
049390520
ABSTRACT:
An X-ray exposure mask provided, including an electrically conductive layer being translucent to an X-ray beam and a light beam, a gold layer formed on the electrically conductive layer, in a thickness so as to be translucent to the X-ray beam and the light beam, for forming a plating base in combination with the electrically conductive layer; a stencil being translucent to the X-ray beam and the light beam and partially formed on the electrically conductive layer so as to have patterns for forming a microscopic patterns onto a semiconductor wafer; and a gold X-ray absorber plated on the plating base for filling apertures of the stencil patterns. A mask alignment for the X-ray mask to the wafer is precisely executed by using the light beam passing through the stencil.
REFERENCES:
patent: 3925677 (1975-12-01), Fraser
patent: 4018938 (1977-04-01), Feder et al.
patent: 4549939 (1985-10-01), Kenworthy et al.
patent: 4696878 (1987-09-01), Shimkunas
Patent Abstract of Japan, vol. 9, No. 291 (E-359)(2014) Nov. 19, 1985 & JP-A-60 132323 (Hitachi Seisakusho) Jul. 15, 1985.
Patent Abstracts of Japan, vol. 7, No. 40 (E-159)(1185) Feb. 17, 1983 & JP-A-57 193031 (Tokyo Shibaura Denki) Nov. 27, 1982.
European Search Report dated Sep. 7, 1989.
Kawashima et al., "Investigation for Plating to Transparent Electrode", 72nd Tech. Conv., Sec. Metal Surface Eng., 1985.
Dees Jose
Fujitsu Limited
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