X-ray or gamma ray systems or devices – Source
Patent
1989-02-07
1990-06-19
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Source
378120, 378121, H05H 124
Patent
active
049359479
ABSTRACT:
A device for generating X-rays is disclosed, which includes a portion for producing plasma in a predetermined space, for generation of the X-rays, and a wall uni effective to define a surface substantially surrounding the space, the wall unit including a portion which is made of a dielectric material and which is made movable so as to compensate for consumption of the dielectric material due to the production of the plasma by the plasma producing portion. Also, an X-ray exposure apparatus usable with a mask having a pattern and a wafer, for transferring the pattern of the mask onto the wafer, is disclosed. The apparatus includes an X-ray source for producing X-rays, an exposure system for exposing the mask and the wafer under an exposure condition, the exposing system including a holder for holding the mask and the wafer so that the mask is exposed to the X-rays from the X-ray source and so that the wafer is exposed to the X-rays passed through the mask, such that the pattern of the mask is transferred onto the wafer, and a control system for controlling the exposure condition so that the pattern transferred onto the wafer has a desired width of line.
REFERENCES:
patent: 4385434 (1983-05-01), Zehnpfennig et al.
patent: 4514858 (1985-04-01), Novak
patent: 4604345 (1986-08-01), Amemiya
A. Zacharias, "X-Ray Lithography Exposure Machines," Solid State Technology, Aug. 1981, pp. 57-59.
D. L. Spears et al., "X-Ray Lithography--A New High Resolution Replication Process," Solid State Technology, Jul. 1972, pp. 21-26.
Canon Kabushiki Kaisha
Fields Carolyn E.
Porta David P.
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