X-ray dispersive and reflective structures and method of making

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350 17, 350166, 378 43, 378 82, 378 84, 427160, 428688, 428704, B32B 702, G21K 106, G02B 100

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046939334

ABSTRACT:
X-ray dispersive and reflective structures and materials are provided which exhibit improved resolution and reflectivity in specific ranges of interest without substantial fluorescence or absorption edges. The structures are formed of metallic and non-metallic layer pairs and can include a buffer layer between each layer to prevent interdiffusion to stabilize the structures. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.

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patent: 4495254 (1985-01-01), Hoffman
Grigorovici, R., "Amorphous Semiconducting Films: Physical Background of Applications," Applications of Thin Films, Proceed. Int. Conf. on Thin Films, May 15-19, 1972, Venice, 1972, pub. by Elsevier Sequoia S. A. Lausanne 1972, pp. 153-155.
Spiller, Evaporated Multilayer Dispersion Elements for Soft X-Rays, 1981, pp. 124-130.
Spiller, et al., Controlled Fabrication of Multilayer Soft X-Ray Mirrors, 1980, pp. 1048-1050.
Underwood, et al., Synthetic Multilayers as Bragg Diffractors for X-Rays, 1981, pp. 170-178.
Underwood, et al., Layered Synthetic Microstructures: Properties and Applications in X-Ray Astronomy, 1979, pp. 123-130.
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Schuller, New Class of Layered Materials, Jun. 16, 1980, pp. 1597-1600.

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