X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-08-01
2006-08-01
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S079000, C378S081000
Reexamination Certificate
active
07085349
ABSTRACT:
An X-ray diffractometer (1) comprising an X-ray source (2) emitting a line focus X-ray beam (3; 11) wherein the larger extension of the beam cross section defines a line direction (4; 12) of the X-ray beam (3; 11), further comprising a sample (6; 13), and an X-ray detector (7) rotatable in a scattering plane around an axis ω intersecting the position of the sample (7) is characterized in that the X-ray source is mounted to a switching device (10), which allows to move the X-ray source into one of two fixed positions with respect to the scattering plane, wherein in the first position the line direction (4) of the X-ray beam (3) is parallel to the scattering plane and in the second position the line direction (12) of the X-ray beam (11) is perpendicular to the scattering plane, and wherein the path of the X-ray beam (3, 11) in the two fixed positions of the X-ray source is the same. This X-ray diffractometer has a simple mechanical setup and allows in plane grazing incidence diffraction as well as regular XRD measurements with good resolution.
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Bruker AXS GmbH
Glick Edward J.
Suchecki Krystyna
Vincent Paul
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