X-ray diffraction measurement method and X-ray diffraction...

Details X-ray diffraction measurement method and X-ray diffraction... X-ray diffraction measurement method and X-ray diffraction...

2007-10-08

2008-10-28

Thomas, Courtney (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S081000, C378S084000

Reexamination Certificate

active

07443952

ABSTRACT:
Disclosed is an X-ray diffraction apparatus that irradiates a sample with X-ray emitted from an X-ray source by resting the X-ray using a divergence slit and detects diffracted X-ray generated from the sample using an X-ray detector. The divergence angle of the divergence slit is a fixed value, and the divergence slit is a slit that restricts the X-ray irradiation width in the sample width direction. The sample is arranged in a longitudinally-elongated manner in which its sample width is smaller than a standard sample width and its sample height is the same as a standard sample height. X-ray intensity calculated based on an output of the X-ray detector is compensated based on an effective divergence angle calculated based on the sample width to thereby obtain true X-ray intensity.

REFERENCES:
patent: 3852594 (1974-12-01), Paolini
patent: 50-063982 (1975-05-01), None
Cullity, B.D., “Elements of X-ray diffraction, New Edition,” KK Agne, Mar. 25, 1989, translated by Gentaro Matsumura (in Japanese).
Cullity, B.D., “Elements of X-ray diffraction, Second Edition,” Addison-Wesley Series in Metallurgy and Materials, Chapter 7, 1978, pp. 188-199, Addison-Wesley Publishing Company, Inc. (in English).

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