X-ray diffraction apparatus and method

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis

Reexamination Certificate

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C378S089000

Reexamination Certificate

active

10511571

ABSTRACT:
A high resolution X-ray diffraction apparatus includes a source4of X-rays and a slit6to direct a collimated beam of X-rays11onto a sample16on a sample stage8.Detector10records the intensity of diffracted X-rays as a function of position along its length. The geometry allows high resolution without the use of a monochromator.

REFERENCES:
patent: 6970532 (2005-11-01), Hayashi et al.
patent: 03-156350 (1991-07-01), None
patent: 2001-141674 (2001-05-01), None
Noma et al., ‘Surface-Sensitive X-ray Fluorescence and Diffraction Analysis with Grazing-Exit Geometry’ X-Ray Spectrometry, vol. 28, 1999, pp. 433-439.
“Grazing excidence diffraction versus grazing incidence diffraction for strain/stress evaluation in thin films” by Anouar Njeh et al.;Powder Diffraction 15(4), Dec. 2000; pp. 211-216.
“Submicron x-ray diffraction and its applications to problems in materials and environmental science” by N. Tamura et al.;Review of Scientific Instruments; vol. 73, No. 3, Mar. 2002; pp. 1369-1372.
“Submicron X-ray diffraction” by A.A. MacDowell et al.;Nuclear Instruments and Methods in Physics ResearchA 467-468 (2001); pp. 936-943.
“Crystallographic Analysis of CVD Films by Using X-Ray Polychromatic Radiation” by B. Lavelle, et al.; 1998Materials Research Society Symp. Proc. vol. 524; pp. 121-126.
“Image Plates as One-Dimensional Detectors in High-Resolution X-ray Diffraction” by A. Kinne et al.;J. Appl. Cryst. (1998); pp. 446-452.
“Real-time in situ x-ray diffractioin as a method to control epitaxial growth” by A.S. Bader et al.;Applied Physics Letters, vol. 82 No. 26; Jun. 30, 2003; pp. 4684-4686.

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