X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-07-10
2007-07-10
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S071000, C378S076000, C378S196000, C378S197000, C378S189000
Reexamination Certificate
active
11011491
ABSTRACT:
In accordance with the present invention, an x-ray diffraction apparatus and method are provided in which an x-ray or goniometer head can be adjusted in different directions to allow the head to direct x-rays at a part from various positions. In this manner, measurements can be taken from a wider region of the part without requiring that the part itself be moved or that an operator move the unit, which can be relatively heavy. In one aspect, the head can be rotated about its internal axis so that it can more readily direct x-rays along curved surfaces of parts while keeping a substantially constant distance therefrom. It is preferred that the apparatus be a portable unit including adjustment mounts to allow the x-ray head to be moved in the different directions so that it can be transported for use in the field at the site at which a part is located. In this instance, the unit allows for measurements to be taken from the part while it remains in service. Accordingly, the present portable unit allows for x-ray diffraction techniques to be used on parts where it is not practical or economic to remove them from service, such as cables or wire ropes used as tension members for bridges. Moreover, the preferred portable x-ray diffraction unit herein provides an easy to interpret readout of the results of its measurements by generating a map at the part site so that, for example, any abnormalities in stress measurements taken will be highlighted in comparison to adjacent points on the map where more normal measurements are shown.
REFERENCES:
patent: 3445655 (1969-05-01), Curry
patent: 3868506 (1975-02-01), Ogiso
patent: 4095103 (1978-06-01), Cohen et al.
patent: 4283628 (1981-08-01), Kulekov et al.
patent: 4686631 (1987-08-01), Ruud
patent: 4747616 (1988-05-01), Burris
patent: 4807273 (1989-02-01), Haendle
patent: 4875228 (1989-10-01), Archer
patent: 4993057 (1991-02-01), Runnells
patent: 5023899 (1991-06-01), Ohlson
patent: 5048070 (1991-09-01), Maehama et al.
patent: 5054043 (1991-10-01), Lucas et al.
patent: 5073912 (1991-12-01), Kobayashi et al.
patent: 5125016 (1992-06-01), Korhonen et al.
patent: 5148458 (1992-09-01), Ruud
patent: 5475730 (1995-12-01), Galando
patent: 5490195 (1996-02-01), Berkley
patent: 5614720 (1997-03-01), Morgan et al.
patent: 5625664 (1997-04-01), Berkley
patent: 5636259 (1997-06-01), Khutoryansky et al.
patent: 6007243 (1999-12-01), Ergun et al.
patent: 6200024 (2001-03-01), Negrelli
patent: 6353656 (2002-03-01), LeVert et al.
patent: 6435715 (2002-08-01), Betz et al.
patent: 6459760 (2002-10-01), D'Ambrosio
patent: 6609826 (2003-08-01), Fujii et al.
patent: 6618465 (2003-09-01), Mohr et al.
patent: 6697453 (2004-02-01), Mueller et al.
patent: 6721393 (2004-04-01), Brauss
patent: 6853706 (2005-02-01), Brauss
patent: 6925146 (2005-08-01), Brauss
Fitch Even Tabin & Flannery
Ho Allen C.
Proto Manufacturing Ltd.
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