X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-07-31
2008-12-30
Yun, Jurie (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S073000
Reexamination Certificate
active
07471766
ABSTRACT:
Disclosed is an X-ray apparatus having an X-ray source, an X-ray detector, a divergence slit, and a scattering slit. The incident angle θ of X-ray to be irradiated on a sample is changed at a predetermined angular speed at measurement time and diffracted X-ray detection angle 2θ at which the X-ray detector detects X-ray is changed in the opposite direction to the θ-direction at an angular speed double that of the X-ray incident angle θ. The slit width of the divergence slit is changed such that the X-ray irradiation width always coincides with the sample width while the slit width of the scattering slit is retained at a constant value. The width of X-ray received by the X-ray detector is restricted by the narrower one of the divergence slit and the scattering slit. The resolution in the high angle region can be kept at a high level.
REFERENCES:
patent: 3852594 (1974-12-01), Paolini
patent: 53-28222 (1978-08-01), None
patent: 3-55890 (1991-12-01), None
patent: 2000-55837 (2000-02-01), None
Buchanan & Ingersoll & Rooney PC
Rigaku Corporation
Yun Jurie
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