X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-04-25
2006-04-25
Church, Craig E. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S081000, C378S071000
Reexamination Certificate
active
07035373
ABSTRACT:
An -ray emitted from an incident optical system is incident on a sample supported by a sample support mechanism, and a diffracted X-ray is detected by a receiving optical system. The incident optical system includes an X-ray source and a multilayer-film mirror. An attitude controlling unit of the sample support mechanism switches a condition of the sample support mechanism from a state maintaining the sample to have a first attitude in which a normal line of the surface of the sample is parallel with a first axis of rotation to another state maintaining the sample to have a second attitude in which the normal line of the surface of the sample is perpendicular to the first axis of rotation. When the receiving optical system is rotated around the first axis of rotation while maintaining the sample in the first attitude, in-plane diffraction measurement is possible. On the other hand, when the receiving optical system is rotated in the same way while maintaining the sample in the second attitude, out-of-plane diffraction measurement is possible.
REFERENCES:
patent: 6014423 (2000-01-01), Gutman et al.
patent: 6069934 (2000-05-01), Verman et al.
patent: 6282263 (2001-08-01), Arndt et al.
patent: 2003/0068010 (2003-04-01), Lentfer
patent: 11-304731 (1999-11-01), None
X. X. Jiang et al: “Study of Strain and Composition of the Self-Organized GE Dots by Grazing Incident X-Ray Diffraction”, Nuclear Instruments & Methods in Physics Research Section—A: Accelerators, Spectrometers, Detectors and Associated Equipment, North-Holland Publishing Company, Amsterdam, NL, vol. 467-468, Jul. 21, 2001, pp. 362-365, XP004297870, ISSN: 0168-9002. * Chapter “2. Experimental” on pp. 363-364.—* reference 12*.
X. Jiang et al: “Status of the 4WIC Beamline and the Diffuse Scattering Experimental Station at the Beijing Synchrotron Radiation Facility”, Nuclear Instruments & Methods in Physics Research Section—B: Beam Interactions With Materials and Atoms, North-Holland Publishing Company, Amsterdam, NL, vol. 129, No. 4, Sep. 1, 1997, pp. 543-547, XP004089038, ISSN: 0168-583X. *Chapter “3. X-Ray Diffuse Scattering Station”—*Figure 2*.
M. S. Goorsky et al: “Grazing Incidence In-Plane Deffraction Measurement of In-Plane Mosaic With Microfocus X-Ray Tubes”, Crystal Resear H and Technology, 2002, Wiley-VCH Verlag Berlin GmbH, Germany, “Online!”, vol. 37, No. 7, pp. 645-653, XP002289273, ISSN: 0232-1300, Retrieved from the Internet: <URL:http://www.crystalresearch.com/crt/ab37/645—a.pdf>, retrieved on Jul. 21, 2004?, *Chapter “Experimental Requirements”*.
“Bede D1 With Microscope”, UCLA Materials Science & Engineering, Online! Nov. 12, 2002, XP002289274, Retrieved from the Internet: <URL:http://www.seas.ucla.edu/igoorsky/xray/Dlmicro. .html>, retrieved on Jul. 21, 2004!, *the whole document*.
Licai Jiang et al: “Application of Multilayer Optics to X-Ray Diffraction Systems”, The Rigaku Journal, Online!, vol. 18, No. 2, 2001, pp. 13-22, XP002289275, Retrieved from the Internet: ,URL:http://www.rigakumsc.com/journal/Vol18.2.2001/Jiang.pdf>, retrieved on Jul. 21, 2004!, *p. 19, last paragraph—p. 20, paragraph 1, Figure 13.*
K. Omote: “Direct Observation of In-Plane Texture in Cobalt Recording Media by Means of a Laboratory-Scale X-Ray Diffractometer”, X-Ray Spectrometry, Nov.-Dec. 1999, Wiley, U.K., vol. 28, No. 6, pp. 440-445, XP009034007, ISSN: 0049-8246—*p. 442*.
B. Verman: “Microfocusing Source and Multilayer Optics Based X-Ray Diffraction Systems”, The Rigaku Journal, Online!, vol. 19, No. 1, 2002, pp. 4-13, XP002289276, Retrieved from the Internet: <URL:http://www.riguksc.com/journal/Vol19.1.2002/verman.pdf>, retrieved on Jul. 21, 2004, *p. 4*, *p. 8, right-hand column, line 5—line 19; table 4*.
A. K. Malhotra et al: “In Situ/Ex Situ X-Ray Analysis System for Thin Sputtered Films”, Surf Coat Technol.; Surface & Coatings Technology, Nov. 10, 1998, Elsevier Science S.A., Lausanne, Switzerland, vol. 110, No. 1-2, Nov. 10, 1998, pp. 105-110, XP002288818—*p. 106*.
“Ultima III”, Rigaku, Online!, Feb. 4, 2004, XP002289277, Retrieved from the Internet: <URLLhttp://www.rigakumsc.com/xrd/ultima.html>, retrieved on Jul. 21, 2002, *the whole document*.
Y. Hirai et al: “The Design and Performance of Beamline BL16XU at Spring-8”, Nuclear Instruments & Methods in Physics Research, Section—A: Accelerators, Spectrometers, Detectors and Associated Equipment, North-Holland Publishing Company, Amsterdam, NL, vol. 251, No. 2-3, Apr. 2, 2004, pp. 538-548, XP004498331, ISSN: 0168-9002, *Chapter “2.5..2. X-ray diffractometer system”, on pp. 545, 546*—reference 22*.
R. Baudoing-Savois, et al., “A new UHV diffractometer for surface structure and real time molecular beam deposition studies with synchrotron radiations at ESRF,” Nuclear Instruments and Methods in Physics Research B 149 (1999), pp. 213-227.
H. Oyangi, et al., “A new apparatus for surface x-ray absorption and diffraction studies using synchrotron radiation,” Review of Scientific Instrument 66, Dec., 1995, Woodbury, New York, U.S.A., pp. 5477-5485.
Church Craig E.
Frishauf Holtz Goodman & Chick P.C.
Rigaku Corporation
Suchecki Krystyna
LandOfFree
X-ray diffraction apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray diffraction apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray diffraction apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3586110