X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1981-08-27
1984-01-17
Gensler, Paul L.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 86, G01N 2320
Patent
active
044267185
ABSTRACT:
The X-ray diffraction apparatus of the invention includes means capable of detecting the position and intensity distribution of the diffracted X-ray with respect to a thin bundle X-ray and means for moving the former means to a position at which the former means is capable of detecting the diffracted X-ray, and makes it possible to reliably and easily carry out rough detection of the position of the diffracted X-ray and fine detection of the intensity distribution of the diffracted X-ray without increasing the size of the diffracted X-ray detecting means.
REFERENCES:
patent: 3596092 (1971-07-01), Marjoram
patent: 3868506 (1975-02-01), Ogiso
Hayashi Makoto
Sakata Shinji
Shimizu Tasuku
Gensler Paul L.
Grigsby T. N.
Hitachi , Ltd.
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