X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-12-27
2005-12-27
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S098110, C378S098120
Reexamination Certificate
active
06980626
ABSTRACT:
Method for an x-ray arrangement for compensation of scattered radiation and x-ray apparatusThe invention concerns a method for an x-ray arrangement comprising two x-ray systems (1, 2) for compensation of scattered radiation. In addition, the invention concerns an x-ray apparatus with two x-ray systems (1, 2) which respectively comprise an x-ray source (4, 5) and an x-ray detector (5, 7). An x-ray scattered radiation image based on the x-ray radiation (11) scattered on a subject (P) is acquired for at least one of the two x-ray systems (1, 2), given a definite positioning of the x-ray systems (1, 2) relative to one another. The acquired x-ray scattered radiation image is saved and used for subtraction from an x-ray image acquired with the x-ray system (1, 2) in order to compensate for the influence of the scattered radiation originating from the other x-ray system (1, 2) and to achieve an improved image quality.
REFERENCES:
patent: 2004/0202280 (2004-10-01), Besson
patent: 2004/0228442 (2004-11-01), Sakaguchi et al.
patent: PS 195 05 283 (1998-04-01), None
patent: OS 198 42 474 (2000-03-01), None
patent: 2000102529 (2000-04-01), None
Groh Burkhard
Heer Volker
Hörnig Mathias
Sandkamp Bernhard
Glick Edward J.
Kao Chih-Cheng Glen
Schiff & Hardin LLP
Siemens Aktiengesellschaft
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