X-ray analyzing apparatus

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

378 81, G01N 2320

Patent

active

056129874

ABSTRACT:
An X-ray analyzing apparatus having high sensitivity and high position resolving power in which an X-ray fluorescent screen made of Gd.sub.2 O.sub.2 S:Tb as a material and having a surface density ranging from 5 mg/cm.sup.2 to 30 mg/cm.sup.2 is used, and an image intensifier and a charge coupled device (CCD) are combined to form an X-ray diffraction two-dimensional detector; and the image intensifier and the CCD are combined with a tapered fiber plate, and an alignment section of a mirror mount tube and a vacuum flexible tube are separated by an X-ray window ambient atmosphere and a vacuum.

REFERENCES:
patent: 3725704 (1973-04-01), Buchanan et al.
patent: 4274000 (1981-06-01), Goebel
patent: 4446568 (1984-05-01), Williams et al.
patent: 4739172 (1988-04-01), Obata et al.
patent: 4821303 (1989-04-01), Fawcett et al.
patent: 4916720 (1990-04-01), Yamamoto et al.
patent: 5127039 (1992-06-01), Hesch
patent: 5216252 (1993-06-01), Boone et al.
patent: 5373544 (1994-12-01), Goebel

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

X-ray analyzing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-ray analyzing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray analyzing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1711766

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.