X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1995-12-08
1997-03-18
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 81, G01N 2320
Patent
active
056129874
ABSTRACT:
An X-ray analyzing apparatus having high sensitivity and high position resolving power in which an X-ray fluorescent screen made of Gd.sub.2 O.sub.2 S:Tb as a material and having a surface density ranging from 5 mg/cm.sup.2 to 30 mg/cm.sup.2 is used, and an image intensifier and a charge coupled device (CCD) are combined to form an X-ray diffraction two-dimensional detector; and the image intensifier and the CCD are combined with a tapered fiber plate, and an alignment section of a mirror mount tube and a vacuum flexible tube are separated by an X-ray window ambient atmosphere and a vacuum.
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Nakajima Kunio
Sudo Shuzo
Porta David P.
Seiko Instruments Inc.
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