X-ray analyzer for testing layered structures

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250273, G01N 2320

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active

041692284

ABSTRACT:
X-ray fluorescence produced by a primary X-ray beam incident at a very flat angle (below 1.degree.) onto the surface of a specimen contained in a vacuum chamber is used to analyze shallow layers and/or to determine depths of shallow surface layers, such as a very thin (typically between about 10A and 10.sup.3 A) silicon coating on Al or Cu layers which overlay a silicon substrate. Semiconductor profile determination may be another application of the invention.

REFERENCES:
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patent: 3765773 (1973-10-01), Weiner
patent: 3839635 (1974-10-01), Chan et al.
patent: 3963922 (1976-06-01), Zulliger et al.
patent: 4028547 (1977-06-01), Eisenberger
L. G. Parratt, "Surface Studies of Solids by Total Reflection of X-Rays," published in Physical Review, Jul. 15, 1954.

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